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Our Approach

We work closely with our clients to co-develop customized CMP, polishing, and cleaning processes and consumables for 100- to 300-mm wafer applications. Co-development is sometimes performed entirely at the customers’ sites, using their processing and metrology equipment, with specific input from our scientists on the adoption of BKMs. Co-development can also initially take place at Araca Inc. using our equipment and BKM, followed by tech-transfer to our customers.

Proven Results

On several occasions, our work has led to the adoption of processes or new consumables in HVM, generating millions of dollars in annual revenue for our customers. Examples include the adoption of new:

CVD-Coated Conditioning Disc CVD-coated conditioning disc for extended life and lower wafer-level defects.
Optimized Polishing Recipe Polishing recipe (one at slightly different pressures and velocities compared to the HVM customer’s BKM) to reduce lateral and normal vibration in high-rate copper CMP, resulting in an order of magnitude lower wafer-level defects.
Pad Groove Design Pad groove design resulting in 25% lower slurry flow rate.
Supramolecular Surfactant Supramolecular surfactant for post-CMP cleaning, resulting in low-stress PVA scrubbing and lower wafer-level defects.
Gritted Diamond Disc Design Gritted diamond disc design resulting in 30% lower slurry flow rate.

Please refer to our Pad Functional Testing Services Brochure as an example of what we have done on pad functional testing.

We’d Like to Work with You to Co-Develop

01 Novel pads, retaining rings, and conditioning discs.
02 Customized copper, tungsten, tantalum, molybdenum, and titanium planarization and post-CMP cleaning processes.
03 3D DRAM and 3D NAND structure delayering.
04 Through Glass Via (TGV) planarization and polishing.
05 Next-generation planarization solutions that involve Flucto-CMP® and SIS®.
06 Silicon carbide substrate polishing processes and eco-friendly slurries.

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Free Consultation

Please contact us for a free consultation on how we may assist you in achieving your process and consumables development objectives.

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