We offer several courses on CMP. The classes are most suitable for individuals with graduate or undergraduate degrees in the sciences and engineering. Over the years, legal, commercial, and business professionals, as well as equipment and process technicians, have also benefited immensely by attending.
Since 2004, Dr. Philipossian has been the Co-Founder, President, and CEO of Araca, Inc., the premier provider of services and equipment to the polishing and planarization industry worldwide. From 2001 to 2022, he was a professor of Chemical Engineering at the University of Arizona, where he held the Koshiyama Chair of Planarization.
He received his BS, MS, and PhD in Chemical Engineering from Tufts University in 1983, 1985, and 1992, respectively. From 1992 to 2001, he was the Materials Technology Manager at Intel (Santa Clara, CA, USA), responsible for the development, characterization, implementation, and sustaining of new and existing CMP and post-CMP cleaning consumables, low-k dielectrics, and electroplating chemicals. From 1986 to 1992, he worked at Digital Equipment Corporation (Hudson, MA, USA) as a process development manager focusing on thermal silicon oxidation, diffusion, LPCVD of dielectric and gate electrodes, and wet cleaning technology. Prof. Philipossian has authored approximately 180 archival journal publications and about 210 articles in conference proceedings. He holds 36 patents in the area of semiconductor processing and device fabrication.
Prof. Keleher is a leading researcher in surface and interface science, focusing on CMP, the development of advanced materials, and sustainable semiconductor processing. Jason received his Ph.D. (Organic Chemistry) from Clarkson University (New York) in 2004 under the guidance of the late Prof. Yuzhuo Li, working on the development of next-generation consumable technologies for CMP of Cu/Low-K devices. Jason was a Postdoctoral Research Scientist at Komag Inc. (now Western Digital), and a Senior Research Scientist at CMC (now Entegris). He is currently the Professor and Chair of the Chemistry Department at Lewis University, where he leads an active research group that combines fundamental molecular mechanisms with applied engineering challenges to drive the design of advanced slurries and cleaning chemistries for CMP and post-CMP processes.
Prof. Keleher has authored 50 archival journal publications and has given 500 technical presentations at various conferences. He holds 25 patents in the area of semiconductor processing and formulation chemistries.
Contact us to learn more about our CMP courses, schedule a session for your team, or discuss a custom course tailored to your needs.
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