Post-CMP Scrubber and Tribometer

Our single-sided PCC-300^® PVA brush scrubber and tribometer is suitable for cleaning 300, 200, 150, and 100 mm blanket and patterned wafers. Based on the robust, and time-tested Struers Labopol-30^® platform and employing most types of flow-through-the-core PVA brushes, the system is equipped with a high-frequency (1,000 Hz) shear force sensor, adjustable brush downforce, automated brush and wafer velocity controllers, up to 2 independent computer-controlled chemical delivery systems, a separate high-flow rinse water line, and a myriad of other standard features.

Built in the USA, the system is powered by our FSX^® proprietary force acquisition and data analysis system, with a superb GUI including calibration, data acquisition, waveform analysis, velocity vector analysis, as well as spectral analysis menus.

Optional equipment includes our latest high-speed (240 Hz) camera and non-flickering LED illuminating system (VID-300^®) for real-time videography. This is an indispensable tool for studying fluid flow around the brush and on the wafer as a function of tool kinematics, pressure, flow rate and nodule design (check out our 10x slow motion video). We also provide an enclosed and sealed environmental chamber (with a 10 cm OD standard tool exhaust port) with an integrated heavy table and a fold-away PC workstation.

The PCC-300^® is intended for use in research and development environments (such as universities, research institutes, post-CMP cleaning consumables suppliers, and end-users) worldwide. It has proven to be indispensable for performing functional tests in an effort to understand the extent of mechanical forces imparted on the wafer surface due to brush mechanical properties, applied downforce, tool kinematics and myriad cleaning solution additives where functional tests are required.

By providing a standardized and affordable post-CMP PVA scrubber and tribometer to the CMP and silicon polishing communities, we are significantly enhancing the rate at which fundamental knowledge is acquired and shared among various stakeholders on a common, robust experimental platform.

Please refer to PCC-300^® Brochure and Heavy Table and Environmental Chamber System Brochure for details on the various features and capabilities of our tool along with our latest product specifications.

Please contact us with any questions.